SAKURA SENSETIVE MASK
20% of active substances: Sakura extract, polyplant anti couperosis phytocomplex, alovera, Kogic mannan.
Manufacturing by technique BUDLIGA DEVIDI which is steam sells of plant origins. It enables active substance transition to the target cells, thus maximize the result 500%.
⦁ Thoroughly hydrates.
⦁ Creamy formula.
⦁ Brings relief.
⦁ Cools.
⦁ Reduce itching.
USE:
⦁ Sensitive skin and capillary-prone skin, irritated skin. ⦁ As follow up to acid exfoliating procedures. ⦁ As follow up to microdermabrasion. ⦁ Following excessive sun exposure and tanning.
⦁ Sensitive skin and capillary-prone skin, irritated skin. ⦁ As follow up to acid exfoliating procedures. ⦁ As follow up to microdermabrasion. ⦁ Following excessive sun exposure and tanning.